Abstract
The effects of alloy composition, cavity aspect ratio, and temperature on the pattern transfer mechanism and mechanics of ZrCu metallic glass (MG) films under a nanoimprinting process are studied using molecular dynamics simulations based on the many-body embedded-atom potential. The simulation results show that the glass transition temperature of ZrCu MGs increases with increasing Zr content. Imprinting at higher temperatures or with a higher cavity aspect ratio shortens filling time. Shear origin zones are more concentrated for imprinting at lower imprint temperatures or a higher cavity aspect ratio. The loading force increases with increasing cavity aspect ratio and decreasing Zr content. The springback ratio of a pattern increases with increasing cavity aspect ratio and decreasing Zr contare the film heights including and ent. For imprinting with a high cavity aspect ratio, the pattern width has much more springback than that of the pattern height. The sharpness of patterns significantly decreases with increasing unloading temperature.
Published Version
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