Abstract
Aluminum oxide thin films attract research interest due to their properties. Aluminum acetate was used as an Al source with acetic acid, oxalic acid, and nitric acid as additives. The transmittance and the thickness of the films strongly depend on the additives, with the approximate bandgap energy changing from 5 ev to 5.4 ev. The aluminum oxide film deposited by dip-coating is presented great uniform surface morphology. The knowledge of the degradation kinetics of materials is essential for investigating the thermal stability of compounds. The acetic acid thin film proved to be the most efficient additive by demonstrating interesting optoelectronic properties. The thin films deposited by dip-coating were characterized by using X-ray grazing incidence diffraction, SEM, UV-Visible spectroscopy. Gamma aluminum oxide thin films prepared by acetic acid can be a good candidate for a wide range of optical applications.
Highlights
Aluminum oxide thin films (Al2O3) exhibits several interesting properties [1, 2], such as high optical transparency [3], high abrasive and corrosion resistance [4, 5], high chemical and thermal stability [6], and wide bandgap [7]
The small weight loss that occurred at 148 °C is mostly caused by desorption of the adsorbed moisture and solvent evaporation, while a large weight loss happens within the temperature range from 182 °C to 540 °C is due to the decomposition of the organic groups by the release of CO2 and H2O
No visible weight loss is detected at temperatures above 540 °C, according to the results acquired, it is suitable to calcine the aluminum oxide thin films at 600 °C
Summary
Aluminum oxide thin films (Al2O3) exhibits several interesting properties [1, 2], such as high optical transparency [3], high abrasive and corrosion resistance [4, 5], high chemical and thermal stability [6], and wide bandgap [7]. Due to the mentioned properties, aluminum oxide thin films possess a wide range of applications in optoelectronics and microelectronics devices serving as insulating [8], hard protective layers [9], surface passivation e.g. for silicon solar cells [10]. The crystalline structure of Al2O3 can take many different forms, including: α, γ, χ, η, θ, κ, δ and ρ [11]. Among these transformations, γ-Al2O3 is a significant material that is employed in a variety of applications, including catalytic substrates in the automotive and. Dip-coating was used due to simplicity, low cost, and the ability to produce high-quality films, and it is widely utilized for the deposition of oxide thin films [25]
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