Abstract
HfO2/SiO2 multilayer reflective film was prepared by electron beam evaporation assisted by ion beams in this paper. The prepared samples were annealed at different temperatures. Multilayer reflective films of HfO2/SiO2 are analyzed at various annealing temperatures in order to determine their optical and mechanical properties. The results show that annealing treatment can effectively reduce film absorption and thermal effects.
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