Abstract
In this work, we study the effect of vacuum annealing and position of metal Cu on structural, optical, electrical and thermoelectrical properties of ITO/Cu/ITO multilayers prepared on glass substrates, at room temperature by Radio Frequency (RF) sputtering. ITO (80 nm)/Cu(5 nm)/ITO (80 nm) ICI(a) and ITO (150 nm)/Cu(5 nm)/ITO (10 nm) ICI(b) multilayers were studied. The effect of vacuum annealing and position of metal Cu on ITO/Cu/ITO multilayers were investigated. The structure of ICI was analyzed by X-Ray Diffraction (XRD), X-Ray Reflectivity (XRR), scanning electron microscopy (SEM) and energy dispersive X-ray (EDX). Moreover, the electrical and optical properties were characterized by the four-point probes method and UV–Vis–NIR transmission measurement, respectively. Effect of the annealing temperature and position of metal Cu on the structural, optical, electrical and thermoelectrical properties were investigated.
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