Effect of using two-step thermal annealing with different ambient gas on Mg activation and crystalline quality in GaN

Abstract

Two-step thermal annealing with different ambient gas was proposed to improve the activation of Mg doping in MOCVD-GaN films; (1) with nitrogen at the first step and followed by oxygen (N2/O2) and (2) with O2 and then by N2 (O2/N2). For comparison, two samples annealed in one-step thermal annealing using air and N2, respectively were also prepared. From Hall-effect measurement, the two-step annealing with the use of O2/N2 treatment was found to give the highest hole concentration at to 5.5×1017cm−3. On the other hand, Raman spectroscopy and XRD measurements revealed that the O2/N2 annealed sample exhibited the smallest compressive strain and FWHM (full width at high maximum) compared to others. Hence, the annealing with O2/N2 is proposed to be the most promising technique that not only to increase the hole concentration effectively but also to improve the crystalline quality of the samples.