Abstract
Time-varying axial magnetic field of approximately 10–15 G is added to an inductively coupled plasma. High aspect ratio deep-sub-micron contact holes in borophosphosilicate glass have been etched by C 4F 8/Ar plasma. In order to correlate etched profile with etching conditions, deposition of polymeric precursors in the etching process is monitored. By means of the appearance mass spectroscopy, the distributions of CF x + ions and CF x radicals are measured as a function of the frequency of axial magnetic field. The axial magnetic field is found to influence the densities of fluorocarbon ions (CF x +; x=1–3), F and CF x radicals. X-ray photoelectron spectroscopy shows that fluorocarbon polymer on oxide surface strongly varies with the frequency of axial magnetic field. 0.2 μm diameter contact holes with aspect ratio of 10 are successfully fabricated in this system.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.