Abstract
Thermal imprinting conditions of low-softening tin phosphate glass with a composition of 67 mol% SnO-33 mol% P2O5 were investigated using three processing parameters of temperature, imprinting pressure, and holding time. Fabrication conditions of a micro square grid (SG) pattern with a similar depth of silica mold (∼120 nm) were optimized. AFM observations confirmed that the 700 nm × 700 nm SG pattern with ∼120 nm depth could be formed with good reproducibility.
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