Abstract

Thermal imprinting conditions of low-softening tin phosphate glass with a composition of 67 mol% SnO-33 mol% P2O5 were investigated using three processing parameters of temperature, imprinting pressure, and holding time. Fabrication conditions of a micro square grid (SG) pattern with a similar depth of silica mold (∼120 nm) were optimized. AFM observations confirmed that the 700 nm × 700 nm SG pattern with ∼120 nm depth could be formed with good reproducibility.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.