Abstract
Switched bias noise measurements on relatively large (>0.8 µm)n-channel MOSFETs have been reported in the literature. Measurements are presented on 0.2/0.18 µm n-channel MOSFETs the noise performance of which seems to be dominated by the effect of a small number of interface states. Switched biasing is seen to influence the dynamic behaviour of these states, and reduce the noise of the devices.
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