Abstract
Megasonic cleaning is one of the promising technologies to remove the particles during semiconductor processing. Acoustic bubble cavitation plays a key role in removing the particles. In this work, the effect of an anionic surfactant sodium dodecyl sulfate (SDS) on a bubble in the presence of hydrogen dissolved DIW water was studied. The bubble dynamics were observed using a high-speed camera. It was found that with the increase of surfactant the bubble characteristics were changed very significantly. Several parameters affecting the bubble dynamics were investigated.
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