Abstract
In the present study, structural and compositional analyses of reactive ion beam sputter deposited aluminum nitride (AlN) thin film of thickness 100 Å are carried out using x-ray reflectivity and x-ray photoelectron spectroscopy techniques. Soft x-ray optical response of the film is derived from energy dependent soft x-ray reflectivity measurements performed in photon energy region of 380–1700 eV. Optical constants (δ and β) obtained from the reflectivity spectra show features corresponding to absorption edges of the constituent elements. Observed fine features in the β profile are further confirmed from x-ray absorption (XAS) measurements carried out in the total electron yield mode. The measured XAS spectra are correlated with electronic and compositional properties of the AlN film. The effects of surface oxidation on soft x-ray optical properties of the AlN thin film are discussed.
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