Abstract
AbstractIndium Tin Oxide (ITO) films were deposited by RF sputtering onto glass and quartz substrates with no external heating. An ITO target containing 10 wt% SnO2 was used for the deposition in a Kurt Lesker PVD75 system, in an atmosphere of 50% O2 + 50% Ar. Post-deposition heat treatments were done on these coatings at 150°C, 300°C and 450°C in an atmosphere of commercial air or argon. The effects of these heat treatments on the microstructure and the properties of the films were evaluated using atomic force microscopy, resistivity measurements, and UV-visible absorption spectroscopy. The heat treatments were observed to significantly affect the properties such as transmittance in the visible region, optical band gap and the electrical resistivity of the films. The main differences are caused by the differences in thermal expansion coefficient of the substrates as compared to the sputtered ITO films.
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