Abstract
Tin oxide films were successfully prepared on glass substrates by radio frequence (RF) magnetron sputtering with a ceramic target under different substrate temperatures. To investigate the influence of substrate temperature on the prepared films, the thickness of as-deposited films was fixed at 240–260 nm. Tin oxide films were annealed at 450°C in air ambient for 60 min. Structure, optical and electrical properties of as-deposited and annealed films have been studied as a function of film thickness and substrate temperature. The crystallinity of the films is strongly dependent on the film thickness and growth temperature, which in turn has a great effect on the optical and electrical properties of the films. The average transmittance in ultraviolet region, E g and resistivity of the films are obviously improved after annealing. The stability of the CdS/CdTe solar cells is improved by introducing the high resistance transparent film (HRT).
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