Abstract
In this paper, the role of substrate temperature in the crystalline textureof MgO films grown by ion beam assisted deposition (IBAD) is investigated.This study reveals that the best in-plane alignment for MgO films grown onY2O3/Si isobtained at ∼25 °C. At this temperature, MgO films with an in-plane orientation distribution as low as3.7° fullwidth at half maximum (FWHM) have been attained. MgO films deposited at temperatures higherthan 100 °C have broad in-plane alignment. Although the deposition at the lowest temperature(−150 °C) did not improve the in-plane texture, the acceptable deviation from the optimum ion tomolecule ratio for achieving biaxially textured films was the largest. As a trend, theacceptable ion to molecule deviation decreases with increasing substrate temperature. Thisstudy is especially important for continuous IBAD MgO depositions where less restrictiveconditions are desired.
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