Abstract
FeSi films with different substrate temperature (T s) were deposited on MgO(001) substrates by radiofrequency magnetron sputtering. During the change of crystal structure from the amorphous to the epitaxial state, the magnetic anisotropy changed in three stages: dominant uniaxial magnetic anisotropy (T s < 400 °C), enhanced cubic magnetocrystalline anisotropy (400 °C ⩽ T s⩽ 600 °C) and weak cubic magnetocrystalline anisotropy (T s = 700 °C and 800 °C). In addition, the resonance frequency ƒ r first decreased and then reached its maximum value before finally disappearing due to the large coercivity field. These results demonstrate the correlation between the structure and static and dynamic magnetic properties of FeSi films, and provide an effective method for preparing soft films with deterministic uniaxial or cubic magnetic anisotropy for practical applications.
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