Abstract
ABSTRACT Using a complex of physical and electrochemical methods, the effect of R-substituent on the adsorption of 5-R-3-amino-1,2,4-triazoles on copper surface in neutral buffer solution was studied. Minimum concentrations C min, which suppresses the first anodic peak of copper dissolution were found, and two different linear correlations of log C min values on induction constant σI were plotted: for compounds with electron-donor and electron-withdrawing ones. Using ellipsometry, free adsorption energies −ΔG 0 а,max were determined. It was shown that adsorption of triazoles with electron acceptor R, which have the highest σI, occurs at very low concentrations and −ΔG 0 а,max = 96.6 kJ mol−1 that is higher than for inhibitors of the same reaction series, but with electron-donor R (70 ÷ 85 kJ mol−1). In this case, monolayers are formed, whose thicknesses are close to molecule size. The formation of chemisorption bonds is confirmed using XPS by studying the composition of adsorption layers formed by 5-CF3-3-amino-1,2,4-triazole on the copper surface.
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