Effect of stress applied on the magnetization profile of Fe–Si–B amorphous wire

Abstract

The effect of tensile stress, σ, on hysteresis loops and magnetization profiles of Fe77.5B15Si7.5 amorphous wires has been measured. Measurements performed by a short movable coil permit one to obtain the dependence of remanent magnetization, μ0Mr, on the position of this coil, L. Increasing applied stress in tensile stress is applied, the initially rectangular local hysteresis loop measured for L=4 cm (at ℓ=8 cm) becomes inclined, but then recovers its rectangular shape for larger stress. The μ0Mr(σ) dependence shows an increase with σ for all L. The stress dependence of both μ0Mr and H* can be understood in terms of a competition between magnetostatic and magnetoelastic energy.