Effect of sputtering temperature on optical properties of TiO2 thin films

Abstract

TiO2 films with different sputtering temperature were prepared on glass and silicon substrates by magnetron sputtering. The morphology, structure, transmittance and Raman spectra of TiO2 thin films were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD) and fluorescence spectrometer. The results show that: (1) the size and uniformity of crystalline particles are different at various sputtering temperatures, and with increasing sputtering temperature, the grain size becomes larger and the better uniformity; (2) with the increase of sputtering temperature, the transmittance of the film samples increases in the range of 200 nm-900 nm; (3) the Raman peak of the films is affected not only by the substrate material, but also by the sputtering temperature under the same substrate, the higher the sputtering temperature, the larger the Raman peak.