Studying The Effect of The Type of Substrate on The Structural, Morphology and Optical Properties of TiO2 Thin Films Prepared by RF Magnetron Sputtering

Abstract

TiO2 thin films were deposited by reactive R.F. magnetron sputtering method on glass, and ITO/glass with thicknesses 80 nm. The deposited films were characterized using X-ray diffraction (XRD), UV-visible spectroscopy and analyzed by the Polarizing Hot Stage Microscope. The structural and morphological properties of the all films were investigated by X-ray diffraction (grain size (D), microstrain (Ɛ), dislocation density (δ) and number of crystals). The optical properties concerning the absorption and transmission spectra were studied for the prepared thin films by UV-vis spectroscopy recorded transmittance spectral data over the wavelengths range (300-1100)nm. The values of some important parameters (absorption coefficient (α), extinction coefficient (k), band gap (Eg), optical conductivity (σ) were studied. It was found that the Structural, morphology and optical properties of the films are dependent strongly on the type of substrates. The absorption edge and optical band gap depended on the crystalline particle size and phase structure of substrate.