Abstract
The effect of deposition parameters such as sputtering power, nitrogen flow rate and thickness of TaNx on the optical performance and chemical durability of composite Tantalum nitride /Ag/ tantalum nitride (TaNx/Ag/TaNx) films was investigated. When the configuration of composite film was TaNx (60nm)/Ag (12nm)/TaNx (60nm) accompanying with the sputtering power 120W and the nitrogen flow rate 50sccm, the visible light transmittance of composite film could reach up to 80% at the wavelength of 550nm and the emissivity was 0.087. In addition, the chemical durability of the coatings was evaluated and the results indicated that the low-e coating presented very good chemical durability.
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