Effect of RF sputtering power on morphological and electrical properties of calcium copper titanate thin films

Abstract

Calcium copper titanate (CCTO) thin films were deposited on p-type silicon substrate by RF magnetron sputtering at various RF powers. Post deposition annealing was carried out for all the samples at 950 °C for 1 h in air atmosphere. Various types of surface morphology have been observed for CCTO thin films with the variation of RF power. The evolution of polycrystalline structure of the CCTO thin films was confirmed by XRD studies. The FTIR characteristic absorption band of CCTO was observed in the range of 400–700 cm−1. The capacitance–voltage (C–V) and current–voltage (I–V) characteristics of the films were investigated employing Al/CCTO/Si MOS capacitors. CCTO films with higher dielectric constant, lower oxide and interface charge density were obtained at higher RF power. Leakage current was also found to be minimum for RF power of 105 W.