Abstract
In order for the colloidal crystal films to be better applied, the influence of relative humidity on the preparation of silica colloidal crystal (SCC) films was systematically studied to solve the problem of different thicknesses of SCC films prepared by different batches under the conditions with the same temperature, concentration of suspension and diameter of the particles. SCC films with 190 nm particles were prepared by static vertical deposition method under different humidity regulated by saturated salt solutions, and the thickness of the films was obtained by an interferometric method. The results showed that the increase in humidity would reduce the thickness of the prepared films, which was believed to be caused by the decrease in evaporation rate after the wetting film absorbs water vapor. A new formula for calculating film thickness was proposed and verified from a series of experiments. With the control of humidity, high-quality SCC films with controlled thickness can be repeatedly prepared.
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