Abstract
In many cases surface ion bombardment results in roughening of metal's and alloy's surfaces. In the present study, a phenomenon of surface roughening inhibition during the ion bombardment is presented. The phenomenon occurred during the plasma extracted ion sputter etching at normal incidence with 400 eV positive ions, when 1% of dried air was added into the plasma forming Ar gas. Two 18%Cr–10%Ni mechanically polished to about 2 nm average roughness (Ra) stainless steel test pieces were sputter etched with and without the air additive. The roughening was inhibited to Ra ≈ 4 nm, which was about 9.5 times lower than that of the sputtered without air additive (Ra ≈ 38 nm). The phenomenon is discussed in terms of chemisorption of active plasma species introduced by the air additive and competing roughening/smoothening mechanisms.
Published Version
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