Abstract
Experiments were performed to investigate the effect of pre-cleaning on surface texturization of mono-crystalline silicon in an KOH/IPA solution. Without appropriate pre-cleaning, surface contamination can cause the formation of pyramids with smaller sizes than those at the non-contaminated areas, leading to inhomogeneous texture features and reflectance non-uniformity on the wafer surface. Depending on the supplier, the surface quality and contamination level of wafers may vary and the pre-cleaning condition may need to be tailored to achieve consistent and desired texturization results.
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