Abstract

Hafnium nitride (HfN) films were deposited on silicon (100) wafer substrate by dc reactive magnetron sputtering. The influences of annealed temperature on structural, morphological and optical property were systematically investigated. The grazing incident X-ray diffraction (GIXRD) results indicated that as-deposited and the annealed HfN thin films were cubic phase. The morphologies and optical property of the prepared samples were obtained by field emission scanning electron microscope (FE-SEM) and UV-Vis-NIR spectrophotometer. The results show that the annealed temperature was effect on the surface morphology. Additionally, the X-ray photoelectron spectroscopy (XPS) was characterized on the as-deposited and annealed sample in order to discuss the chemical compositions.

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