Abstract
In this study, CuCrO2 thin films were fabricated by spin-coating technique on alkali-free glass substrates and a two-step annealing process. The copper-based delafossite CuCrO2 is a p-type transparent conductive oxide that exhibits a wide energy bandgap and excellent stability. To improve the transmittance of CuCrO2 thin films, polyvinylpyrrolidone (PVP) was used as a porogen for preparing thin films with high transmittance and high haze values. The highest transmittance of 73.75% was achieved with 0.5 g of PVP. The bandgaps of prepared CuCrO2 thin films were estimated at 2.82 eV to 3.11 eV. The prepared CuCrO2 thin films had a porous structure and high transmittance. The high potential transmittance of porous CuCrO2 thin films makes them applicable to photovoltaic systems, transistors and touch screens or displays in the future.
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