Abstract
Cubic MgZnO thin films were deposited on amorphous quartz substrate by PLD method. Effect of deposition pressure on preferential orientation and optical absorption characteristics of MgZnO thin films were studied. The preferred orientation of cubic MgZnO changed from (200) to (111) when deposition pressure increased, and absorption edges of which shift to longer wavelength direction because Mg content of MgZnO thin film decreased. Cubic MgZnO showed much better crystal quality and preferential orientation growth characteristics on proper crystal substrate, because on this substrate the preferred orientation of cubic MgZnO is accordance with that grown in free growth mode on amorphous substrate at special air pressure.
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