Effect of nitrogen concentration on the magnetic properties of Fe-Ta-N thin films

Abstract

Soft magnetic nanocrystalline thin films with a high content of Ta (10 wt %) are synthesized by the method of reactive RF magnetron sputtering with subsequent annealing. It is established that the microstructure and magnetic properties of the films depend on the nitrogen partial pressure during sputtering and on the annealing temperature. Annealing of the amorphous films leads to the formation of α-Fe nanocrystallites whose properties and interactions determine the film parameters. A decrease in the α-Fe grain size to a level below the length of ferromagnetic exchange interaction sharply increases the magnetic softness. The role of nitrogen ions in the formation of a α-Fe nanocrystallite structure and uniaxial magnetic anisotropy of Fe-Ta-N films is established. The optimum technological regimes of deposition and annealing of the Fe-Ta-N films are determined, which ensure the synthesis of Fe-Ta-N nanocrystalline thin films with a high magnetic softness (Bs=1.6 T, Hc=0.2 Oe, and μ1(1 MHz)=3400).