Abstract
The effects of Na2O-SiO2slag treatment on purification of metallurgical grade silicon by leaching with hydrogen fluoride have been investigated. A comparative analysis of microstructure evolution was carried out to examine the leaching behavior of impurities from metallurgical grade silicon. It was found that the distribution of metal impurities Al, Ca, Ti and Na, which co-deposited with Si and formed different intermetallic phases at grain boundaries, had manifest distinction between precipitated phase and silicon. Moreover, acid corrosion experiment results revealed that slag treatment improved the dissolution rate of metal impurities from metallurgical grade silicon as contrasted to that without slag treatment.
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