Abstract
Improvement in the optical properties of ZnO films grown on glass substrates was investigated using a N2O-doped buffer layer inserted between the glass substrate and a ZnO film deposited by chemical vapor deposition (CVD). ZnO films were grown at 773 K using dimethylzinc (DMZn) and high-temperature H2O generated by catalytic reaction as zinc and oxygen sources, respectively. Crystal growth was enhanced for the ZnO film grown on the N2O-doped buffer layer, and the fluctuation in crystal orientation along the c-axis became less than that for a film grown directly on the glass substrate by CVD. The optical transmittance of the film in the wavelength range of 375–700 nm also increased with insertion of the buffer layer.
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