Abstract
Based on probe measurements, the plasma density in a low pressure H2 radio-frequency (RF) magnetized cylindrical hollow-cathode capacitively coupled plasma (CCP) is demonstrated to be enhanced by applying a multi-cusp magnetic field (MCMF). CCPs can be used for fabricating functional thin-films, but are currently limited by low plasma densities of less than or about 1016 m−3. It is found that a maximum plasma density of 2.51, 2.88, and 3.14 × 1016 m−3 is obtained at 3, 4 and 5 Pa, respectively. The employed MCMF arrangement contributes to achieving superior plasma uniformity, both in axial and radial direction, at an RF power of 50 W.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
