Abstract
Based on probe measurements, the plasma density in a low pressure H2 radio-frequency (RF) magnetized cylindrical hollow-cathode capacitively coupled plasma (CCP) is demonstrated to be enhanced by applying a multi-cusp magnetic field (MCMF). CCPs can be used for fabricating functional thin-films, but are currently limited by low plasma densities of less than or about 1016 m−3. It is found that a maximum plasma density of 2.51, 2.88, and 3.14 × 1016 m−3 is obtained at 3, 4 and 5 Pa, respectively. The employed MCMF arrangement contributes to achieving superior plasma uniformity, both in axial and radial direction, at an RF power of 50 W.
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