Abstract
Thin film borophosphosilicate glasses, SiOxByPz, have been obtained by chemical vapor deposition on (100) Si substrates. The interaction of low-energy N2+ ions with these films has been studied by x-ray photoelectron spectroscopy (XPS) and infrared spectroscopy. Determination of the chemical composition of the borophosphosilicate glasses was done by qualitative and quantitative XPS analysis. The differences in composition between the films before and after the bombardment have been explained in terms of the relative thermodynamic stability of the compounds present in the sample.
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