Abstract
A micropatterning of nanocrystalline quantum dots (NQD) films using lift-off process has been proposed and experimentally demonstrated earlier. In this paper, the conditions of patterning process are investigated in order to define process parameters window for the lift-off procedure. The patterning of NQD CdSe/ZnS films using lift-off is studied in terms of photoresist thickness, solvent composition, and substrate material. The outcome of the process is monitored by means of fluorescence microscopy, atomic force microscope, and optical microscopy. The results show that patterns less than 1 μm can be resolved in NQD films with minimal alteration of the film characteristics, provided the photoresist layer is thicker than about 100 nm and acetone used as a solvent is spiked with toluene up to 10% of the solvent volume. The performance of the process in terms of resolution and film quality was found to be independent of the substrate used.
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