Abstract

ABSTRACT Background: The success rates of dental implants are largely dependent on implant instrumentation procedures. It’s still unknown, nevertheless, how successful sophisticated instrumentation techniques are in comparison to older methods. Methods: One hundred patients receiving dental implants participated in a prospective study that was carried out in a tertiary care facility. Random assignments were made to place patients in Group B (advanced instrumentation) or Group A (conventional instrumentation). Following implant implantation, clinical indicators, such as implant stability and peri-implant bone loss, were evaluated on a regular basis. A statistical analysis was conducted in order to compare the results among the groups. Results: Compared to implants placed using conventional procedures (75.2 ± 3.4), implants placed using advanced instrumentation techniques showed considerably improved stability (82.6 ± 2.9) (P < 0.001). Furthermore, there was a statistically significant difference in peri-implant bone loss between the advanced instrumentation group (0.4 ± 0.1 mm) and the traditional instrumentation group (0.8 ± 0.2 mm) (P = 0.003). Conclusion: In summary, current research indicates that, in comparison to conventional methods, sophisticated instrumentation techniques enhance implant stability and decrease peri-implant bone loss. These findings have significant ramifications for implant dentistry clinical procedures as well as patient outcomes.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.