Abstract
Due to have superior properties as fotocatalyst and have wide band gap, TiO2 thin films often investigated by researchers and used by technological applications widely. In this study TiO2 films were deposited on glass substrate by Sol-Gel Spin Coating Technic. TiO2 films were deposited at different number of layer and then annealed at 400o C, 500o C, and 600o C in air. Effect of anneal temperature to structural properties were investigated by XRD analysis. It was observed by the light of XRD results that the structural properties of films had changed by anneal temperature.
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