Abstract
NiZn-ferrite thin films were deposited by radio frequency magnetron sputtering. The effects of sputtering pressure, substrate temperature, and annealing temperature on the structure and magnetic properties of the NiZn-ferrite thin films were investigated. The results revealed that the lower sputtering pressure was beneficial for the crystallization and grain growth of the NiZn-ferrite films, and the saturation magnetization and coercivity of the films monotonously decreased with increasing the sputtering pressure. Moreover, it was also suggested that a higher substrate temperature could improve the crystallinity and saturation magnetization of the thin films. Additionally, the saturation magnetization monotonously increased with increasing the annealing temperature, while the coercivity exhibited a minimum at an annealing temperature of about 600 °C. The change of saturation magnetization and coercivity as a function of sputtering pressure, substrate temperature and annealing temperature could be attributed to the varied crystallinity, grain size, cation distribution and the intrinsic stress of the films.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call