Abstract
The microstructure and crystallinity of epitaxial YB 2Cu 3O 7− x (YBCO) thin films grown on a silicon using a buffer of Eu 2CuO 4 (ECO)/Yttrium-stabilized Z rO 2 (YSZ) were investigated by X-ray high-resolution diffraction, small angle reflection, and reciprocal space map, as well as atomic force microscopy. The results showed that YBCO films with a buffer of ECO/YSZ were well oriented in the [00L] direction perpendicular to the substrate surface. The rocking measurements for the YBCO films grown on ECO/YSZ buffered Si show a smaller value of the full widths at half maximum (∼2.07°) in comparing with that of the YBCO with a single YSZ buffer (∼4.48°). Moreover, the surface morphology of YBCO films with an ECO/YSZ buffer is significantly improved. The average size of grains on the surface was much smaller, indicating that growth of YBCO on Si with such a buffer of ECO/YSZ is highly epitaxial.
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