Abstract
In this work, an experimental research on a low voltage DC magnetron plasma sputtering (0-650) volt is used for coating gold on a glass substrate at a constant pressure of argon gas 0.2 mbar and deposition time of 30 seconds. We focused on the effects of operating conditions for the system such as, electrode separation and sputtering current on coated samples under the influence of magnetic flux. Electron temperature and electrons and ions densities are determined by a cylindrical single Langmuir probe. The results show the sensitivity of electrode separation lead to change the plasma parameters. Furthermore, the surface morphology of gold coated samples at different electrode separation and sputtering current were studied by atomic force microscopy (AFM). The AFM analysis showed that the variation of average grain diameter and average grain height is nonlinear with a minimum value of average grain diameter 90 nm at electrode separation of 4 cm and 30 mA sputtering current.
Highlights
Glow discharge sputtering technologies are used in different applications such as, in industrial and medicine for deposition thin film and surface treatment [1,2,3,4,5,6,7]
A single cylindrical Langmuir probe made of tungsten wire of 0.5 mm diameter, and 5 mm length is positioned near the cathode at a distance of 18 mm to characterize the plasma parameters
The results from the present work, established that the inter-electrode gap and the operational conditions for the system are important parameters, which has a significant impact on the spatial morphology of thin gold coating obtained by sputtering in the magnetron glow discharge
Summary
Glow discharge sputtering technologies are used in different applications such as, in industrial and medicine for deposition thin film and surface treatment [1,2,3,4,5,6,7]. Plasma magnetron sputtering is the most popular techniques used for nanotechnologies and coating samples. In this system, denser confinement plasma for a noble gas is generated by a magnetic placed behind the cathode electrode. Denser confinement plasma for a noble gas is generated by a magnetic placed behind the cathode electrode This magnetic field is caused for trapping and forced the free electrons with drift motion so that, it leads a higher rate of sputtering [10,11,12].
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