Abstract
The effect of an x-ray emitting spot with cylindrical symmetry in gas plasma sources is studied using the XMAS x-ray lithography program taking into account variations of x-ray illumination on the exposed wafer. These divergence effects may affect the process latitude across the exposure field. Maximum limits in the dimensions of the cylindrical x-ray source are determined using the XMAS simulation. The effective x-ray source size of the Science Research Laboratories plasma source was measured using the appropriate filters to simulate x-ray lithography. The experimental results indicate that no adverse divergence effects should be expected in a 4.4 cm diameter exposure field at 63.5 cm from the source.
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