Effect of Channel Engineering on Quasi-Static Capacitance-Voltage Characteristics of Double-Gate MOSFET

Abstract

The quasi-static capacitance–voltage (QSCV) characteristics of 10-nm-gate-length double-gate N-type metal–oxide–semiconductor field-effect transistors (NMOSFETs) with Si, Ge, InAs, $$ {\hbox{In}}_{0.53} {\hbox{Ga}}_{0.47} {\hbox{As}} $$ , and GaAs as channel materials are studied and simulated using Silvaco ATLAS three-dimensional (3D) technology computer-aided design (TCAD) software. The QSCV approach offers the advantage of immunity against frequency dependence effects and the ability to measure small capacitances in the 100 fF range. In this device, we consider the self-consistent solution of Schrodinger’s equation with Poisson’s equation. The splitting of the conduction band into multiple subbands is considered, while there is no doping in the channel region. The effects of metal gate electrode engineering, channel engineering (Si, Ge, GaAs, $$ {\hbox{In}}_{0.53} {\hbox{Ga}}_{0.47} {\hbox{As}} $$ , and InAs), and different channel thicknesses with $$ \left( {{\hbox{Al}}_{2} {\hbox{O}}_{3} } \right) $$ as gate oxide having thickness of 0.8 nm on the QSCV characteristics are studied. A comparison of the QSCV characteristics is carried out for the above-mentioned channel materials, revealing a significant reduction in the inversion-mode QSCV characteristics for all the materials due to quantization that results in a decrease in the overall gate-to-channel capacitance and hence increases the threshold voltage of the MOS device. The QSCV characteristics are also useful to measure the oxide thickness, flat-band voltage, threshold voltage, maximum depletion region thickness, charge distribution in the dielectric, interface trap charge, and interface states between the channel and gate oxide before device fabrication.