Abstract
BF2 implantation is widely used to form P wells, adjust channel threshold voltage, and reduce short channel effects. In this letter, we study effect of BF2 implantation on ultrathin gate oxide reliability. It has been found that BF2 implantation into Si substrate causes degradation of gate oxide reliability in the ultrathin oxide thickness regime. N2O oxide can be used to reduce degradation caused by the implantation and improve gate oxide reliability.
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