Abstract
Plasma plume propagation of a nickel thin film and its interaction with ambient gas have been studied in a range of background pressures. The Stark broadening of neutral nickel lines is studied in correlation with Hα line broadening, and the Stark broadening parameters of nickel lines are estimated. The evolution of plasma plume is characterized by means of spectroscopic measurements which is supported by fast imaging. The data show that the background pressure confines the plasma plume and thus helps increase the electron density.
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