Abstract
This paper concerns the acid evaporation caused by the baking treatment of chemically amplified resists. The evaporation of photo- generated acid during the post-exposure-baking (PEB) process was measured as a spectral change of indicator film that consisted of polyvinyl alcohol (PVA) and tetrabromophenol blue sodium salt (TBPB). Using this method, it was observed that the amount of evaporated acid depended on the pre-baking and PEB conditions. A high temperature pre-baking before exposure reduced the amount of evaporated acid. By contrast, a high temperature PEB accelerated the acid evaporation, and the thickness of the insoluble layer increases with increasing PEB temperature. These results suggest that acid evaporation is concerned with the formation of the insoluble layer.
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