Abstract
ITO films deposited on ZrO 2 undercoats by sputtering were investigated. The ITO films have a fine grain structure, compared to a grain–subgrain structure of conventional ITO films grown on a glass substrate. The grain structure of the ITO films grown on ZrO 2 consists of 30–50 nm wide almost parallel-sided columns. The surface grains have a good uniformity in shape and size. The microstructure and electrical properties of the ITO films changed with increasing ZrO 2 thickness. This indicates that the microstructure and properties of ITO films can be controlled by the ZrO 2 film thickness. The OLED fabricated on the ITO films on ZrO 2 worked with lower driving voltage than the one fabricated on conventional ITO films at the same luminance.
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