Abstract

We have demonstrated 4H-SiC super junction V-groove MOSFETs (SJ-VMOSFETs) with an extremely low specific on-resistance ($R_{on, sp}$) of $0.67 \mathrm{m}\Omega$ cm2 and with a high blocking voltage (V B ) of 1170 V [1]. We have adopted double reduced surface junction termination extensions (DR-JTEs) as a new edge termination for the SJ-VMOSFETs in order to deplete the highly doped drift layer and current spreading layer (CSL) over 1x10$^{17} cm^{-3}$. We evaluated the process robustness of the DRJTEs and other conventional edge terminations by using TCAD simulation.

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