Abstract
We present a process for fabricating small catalyst particles for carbon nanotube growth on insulating substrates. For this purpose we define hydrogen silsesquioxane (HSQ) resist structures on top of conducting and grounded metallic catalyst layers and a sacrificial chromium layer, using e-beam lithography.The developed resist structures act as an etch mask in the subsequent ion milling step, by which the surrounding metal layers are removed. Having wet etched the Cr mask and HSQ resist, metal structures remain which serve as catalyst in a chemical vapour deposition (CVD) process resulting in single wall carbon nanotubes with a diameter range of 0.8–2.0nm on insulating substrates.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.