Abstract
Growth models for vapor depositions in which evaporation and deposition can occur, both at a randomly chosen column and at its nearest neighbor columns (NNCs), are studied by Monte Carlo simulations. The growth processes in these models are determined by comparing local chemical potentials of the chosen column and its NNCs to the chemical potential of vapor. The universality classes and the characteristics of the models are studied by the scaling ansatz of kinetic roughening and by measurements of tilt-dependent currents and height step widths. Through measurements of the ratio of number of growth processes at NNCs to those at the chosen column, the key processes which are relevant to the determination of the universality class are also studied.
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