Abstract
This paper reports the dynamics of laser-assisted discharge plasmas for extreme ultraviolet (EUV) sources. A pulsed laser was focused on the tin cathode surface to form vapor jet across 5 mm long anode–cathode gap where pulsed power was applied later on. Comparison of time-resolved pinhole EUV imaging and high speed visible photography reveals that intensive EUV is emitted only from the neck of the hot plasma, which starts showing up near the laser spot on the cathode and moves away from the cathode. This movement of the neck plasma results in the enlargement of the EUV emissive region acting as its source.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
