DRIE based technology for 3D silicon barcodes fabrication

Abstract

Microworld barcoding has become a promising tool for cell biology. Individual and subpopulation cell tracking is of great interest to evaluate cell behaviour. Nowadays, many micrometer and even nanometer size silicon structures can be fabricated using microelectronics techniques. In this work we report for first time the development of 3D barcodes based on silicon substrate. The proposed silicon micromachining technology based on deep reactive ion etching (DRIE) allows to obtain micrometer-sized cylindrical structures with vertical etch profile that defines a bit = 1 and non-vertical etch profile that defines a bit = 0. Although this technology will allow more than 15 bits representation, only 4–8 bits are necessary for cell labelling. The results of this work show that DRIE has become a versatile technique to produce high aspect 3D biocompatible silicon-based barcodes structures for cell studies.