Domain-wall induced giant tunneling electroresistance effect in two-dimensional Graphene/In2Se3 ferroelectric tunnel junctions

Abstract

Ferroelectric tunnel junctions (FTJs) are very promising as a new type of nonvolatile memory devices due to the tunneling electroresistance (TER) effect. In recent years, with the rise of two-dimensional (2D) materials, 2D ferroelectrics and their application in FTJs have attracted intensive attention, with the advantage of greatly reducing the FTJ based memory device sizes, as demanded by the ongoing device minituriazation in modern electronic circuits. However, all present schemes for realizing giant TER ratio with 2D FTJs are based on the polarization reversal of the whole ferroelectric layer upon an electrical field. In this work, we explore the quantum transport properties of the 2D FTJs with the partial reversal of polarization, namely, the formation of domain walls (DWs) by constructing two kinds of FTJs. One is in a uniform-polarization state and the other one is a state with domain walls. Structural relaxation confirms the stability of the domain-wall state. By quantum transport calculation, we obtain a TER ratio as high as 2.75 × 10 4 % . Further analysis of the electronic structure shows that there is charge accumulation or charge depletion at the two DWs. Such asymmetric interface polarization charges result in a built-in electrical field and thus affect the distribution of the effective potential along the transport direction. This leads to partial metal-insulator transition around the DWs and finally the giant TER ratio. Our results indicate that DWs may greatly affect the quantum transport and provide a new mechanism for realizing giant TER effect in 2D FTJs.