Abstract
Uniform coating of the thick diamond-like carbon (DLC) on three-dimensional substrates was studied using a hybrid process of plasma-based ion implantation and deposition (PBIID). In the PBIID system, an RF pulse for plasma generation and a negative high-voltage pulse for ion implantation were supplied to a substrate through a single electrical feedthrough. Then the high-density plasma was produced along the substrate, leading to the formation of uniform coating film and the ion implantation on three-dimensional substrates. Ion implantation by PBII technique served to the reduction in compressive residual stress of DLC film and the formation of mixing layer between the DLC film and the substrate. As a result, the thick and good-adhesive DLC film with more than a few μm in thickness was almost uniformly prepared on the surface of cylindrical pipe, triangle prism, and trench structure. The deposition rate was approximately 1 μm/h using the toluene as a precursor gas. The hardness of the DLC films was found to be about 12 GPa by nano-indentation method.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
